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Biomicrofluidics 6, 016502 (2012); http://dx.doi.org/10.1063/1.3683164 (8 pages)

Wafer-scale fabrication of high-aspect ratio nanochannels based on edge-lithography technique

Quan Xie1,2, Qing Zhou3,4, Fei Xie1, Jianming Sang3, Wei Wang1, Haixia Alice Zhang1, Wengang Wu1, and Zhihong Li1

1National Key Laboratory of Science and Technology on Micro/Nano Fabrication, Institute of Microelectronics, Peking University, Beijing 100871, People’s Republic of China
2Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, Michigan 48109, USA
3School of Basic Medical Science, Peking University, Beijing, People’s Republic of China
4Department of Biomedical Engineering, University of California at Davis, Davis, California 95616, USA

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(Received 11 December 2011; accepted 15 January 2012; published online 9 February 2012)

This paper introduced a wafer-scale fabrication approach for the preparation of nanochannels with high-aspect ratio (the ratio of the channel depth to its width). Edge lithography was used to pattern nanogaps in an aluminum film, which was functioned as deep reactive ion etching mask thereafter to form the nanochannel. Nanochannels with aspect ratio up to 172 and width down to 44 nm were successfully fabricated on a 4-inch Si wafer with width nonuniformity less than 13.6%. A microfluidic chip integrated with nanometer-sized filters was successfully fabricated by utilizing the present method for geometric-controllable nanoparticle packing.

© 2012 American Institute of Physics

Article Outline

  1. INTRODUCTION
  2. FABRICATION
  3. RESULTS AND DISCUSSIONS
  4. CONCLUSIONS

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KEYWORDS, PACS, and IPC

PACS

  • 87.80.Ek

    Mechanical and micromechanical techniques

International Patent Classification (IPC)

  • B81B

    Micro-structural devices or systems, e.g. micro-mechanical devices

  • B82B1/00

    Nano-structures

  • B82B3/00

    Manufacture or treatment of nano-structures

  • C12

    Biochemistry; Beer; Spirits; Wine; Vinegar; Microbiology; Enzymology; Mutation or genetic engineering

ARTICLE DATA

PUBLICATION DATA

ISSN

1932-1058 (online)

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