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Biomicrofluidics / Volume 4 / Issue 2 / FABRICATION AND LABORATORY METHODS

Biomicrofluidics 4, 026503 (2010); http://dx.doi.org/10.1063/1.3437589 (6 pages)

E-beam lithography for micro-/nanofabrication

Matteo Altissimo

Melbourne Centre for Nanofabrication, 151 Wellington Rd., Clayton, Victoria 3168, Australia

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(Received 18 March 2010; accepted 5 May 2010; published online 15 June 2010)

Electron beam lithography (EBL) is one of the tools of choice for writing micro- and nanostructures on a wide variety of materials. This is largely due to the fact that modern EBL machines are capable of writing nanometer-sized structures on areas up to mm2. The aim of this contribution is to give technical and practical backgrounds in this extremely flexible nanofabrication technique.

© 2010 American Institute of Physics

Article Outline

  1. INTRODUCTION
  2. EBL SYSTEMS
  3. TERMINOLOGY AND CONCEPTUAL WORKFLOW
    1. Conceptual design
    2. CAD design
    3. Conversion and proximity correction
    4. Sample preparation
    5. Machine calibration
    6. Exposure
    7. Development
  4. EXAMPLE

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KEYWORDS and PACS

Keywords

electron beam lithography, microfabrication, nanobiotechnology, nanofabrication, nanostructured materials

PACS

ARTICLE DATA

Digital Object Identifier
http://dx.doi.org/10.1063/1.3437589

PUBLICATION DATA

ISSN

1932-1058 (online)

Publisher

$abstract.society.value is a Member of CrossRef American Institute of Physics

For access to fully linked references, you need to log in.
    Y. Ruan, M. -K. Kim, Y. -H. Lee, B. Luther-Davies, and A. Rode, Appl. Phys. Lett. 90, 071102 (2007)APPLAB000090000007071102000001.

    M. Baba, T. Sano, N. Iguchi, K. Iida, T. Sakamoto, and H. Kawaura, Appl. Phys. Lett. 83, 1468 (2003)APPLAB000083000007001468000001.


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